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Photomask Fabrication Technology (Professional Engineering)
Photomask Fabrication Technology - Professional Engineering
Author: Benjamin G. Eynon, Banqiu Wu
Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool?s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investme...  more »
ISBN-13: 9780071445634
ISBN-10: 0071445633
Publication Date: 7/21/2005
Pages: 500
Edition: 1
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Publisher: McGraw-Hill Professional
Book Type: Hardcover
Members Wishing: 0
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